Description
As Corporate Applications Engineer for Mask Synthesis, you will be the primary technical contact for customers, supporting Proteus OPC & ILT, RET tool.
The simulator covers a wide range of applications in optical, immersion, extreme ultraviolet (EUV), and electron beam (e-beam) lithography, allowing for precise verification & process margin validation and thorough focus & dose analysis of overall optical & resist proximity effects.
Further, as the product expert you will work with PE, R&D in Europe/US, sales, and our customers to help drive the development and acceptance of our products.
Duties include both pre-sales and post-sales activities such as technical support of the product, testing, example creation, benchmarking, technical training, and onsite evaluation support.
At customers and within Synopsys departments the candidate will also interface and support various engineers for mask synthesis working on Lithography Proximity Correction.
Minimum Requirements
- The candidate holds an advanced degree (Master or PhD) in Physics, Computer Science, Chemistry, Material Science, or Electrical Engineering.
- Hands-on in computer skills, including Windows, Linux, scripting (e.g. TCL, Python, Perl) and programming skills. Experience with MATLAB or TCL is an advantage.
- Excellent communication and organizational skills are required to handle customer projects proactively and support request efficiently.
- Strong desire and ability to work on new topics to overcome future lithographic challenges in semiconductor industry.
- Successful candidate has high self-motivation and can work independently without day-to-day supervision.
- Strong networking tasks with internal teams or external customers or cross functional projects demand good verbal and written English skills.
- Excellent problem-solving skills.
Preferred Requirements
- The position requires at least 3+ years experiences with advanced patterning and/or mask fabrication techniques as well as a good background in general semiconductor manufacturing technology.
- Knowledge of lithography Mask synthesis (OPC, RET & LRC) and/or Lithography simulation is desired.
- Experience with photolithography theory including optics, mask or wafer topographic EMF modeling or resist modeling is a strong advantage.